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Silicon Nitride Membrane

Revision as of 13:38, 1 August 2018 by Himpe (talk | contribs) (Himpe moved page Silicon nitride membrane to Silicon Nitride Membrane: consistent capitalization)


Description

Figure 1: silicon nitride membrane temperature profile

A silicon nitride membrane (SiN membrane) [1] can be a part of a gas sensor, but also a part of an infra-red sensor, a michrothruster, an optimical filter etc. This structure resembles a microhotplate similar to other micro-fabricated devices such as gas sensors [2] and infrared sources [3]. See xx--CrossReference--dft--fig:tempprof--xx, the temperature profile for the SiN membrane.

The governing heat transfer equation in the membrane is:

 \nabla \cdot (\kappa \nabla T)+Q - \rho c_p \cdot \frac{\partial T}{\partial t}=0

where \kappa is the thermal conductivity in W m^{-1} K^{-1}, cp is the specific heat capacity in  J kg^{-1} K^{-1}, \rho is the mass density in kg m^{-3} and T is the temperature distribution. We assume a homogeneous heat generation rate over a lumped resistor:

Q = \frac{u^2(t)}{R(T)}

with Q the heat generation rate per unit volume in W m^{-3}. We use the initial condition  T_0 = 273K , and the Dirichlet boundary condition  T = 273 K at the bottom of the computational domain.

The convection boundary condition at the top of the membrane is


q=h(T-T_{air}),

where h is the heat transfer coefficient between the membrane and the ambient air in W m^{-2} K^{-1}.

Discretization

Under the above convection boundary condition and assuming T_{air}=0, finite element discretization of the heat transfer model leads to the parametrized system as below,


(E_0+\rho c_p \cdot E_1) \dot{T} +(A_0 +\kappa \cdot A_1 +h \cdot A_2)T = B \frac{u^2(t)}{R(T)}, \quad
y=C T,

where the volumetric heat capacity \rho c_p, thermal conductivity \kappa and the heat transfer coefficient h between the membrane are kept as parameters. The volumetric hear capacity \rho c_p is the product of two independent variables, i.e. the specific hear capacity c_p and the density \rho. The range of interest for the four independent variables are respectively \kappa \in [2, 5], c_p \in [400, 750], \rho \in [3000,3200],  h \in [10, 12]. The frequency range is f \in [0,25]Hz. What is of interest is the output in time domain. The interesting time interval is t \in [0,0.04]s

Here R(T) is either a constant heat resistivity R(T)=R_0, or R(T)=R_0(1+\alpha T), which depends linearly on the temperature. Here we use R_0=274.94 \Omega and temperature coefficient \alpha=2.293 \pm 0.006 \times 10^{-4}. The model was created and meshed in ANSYS. It contains a constant load vector B corresponding to the constant input power of 2.49mW. The number of degrees of freedom is n=60,020.

The input function u(t) is a step function with the value 1, which disappears at the time 0.02s. This means between 0s and 0.02s input is one and after that it is zero. However, be aware that u(t) is just a factor with which the load vector B is multiplied and which corresponds to the heating power of 2.49mW. This means if one keeps u(t) as suggested above, the device is heated with 2.49mW for the time length of 0.02s and after that the heating is turned off. If for whatever reason, one wants the heating power to be 5mW, then u(t) has to be set equal to two, etc... When R(T)=R_0(1+\alpha T), it is a function of the state vector T and hence, the system has non-linear input. (It is also called a weakly nonlinear system.)

Data

The model is generated in ANSYS. The system matrices are in MatrixMarket format and can be downloaded here: SiN_membrane.tgz.

References

  1. T. Bechtold, D. Hohfeld, E. B. Rudnyi and M. Guenther, "Efficient extraction of thin-film thermal parameters from numerical models via parametric model order reduction", J. Micromech. Microeng. 20(2010) 045030 (13pp).
  2. J. Spannhake, O. Schulz, A. Helwig, G. Müller and T. Doll, "Design, development and operational concept of an advanced MEMS IR source for miniaturized gas sensor systems", Proc. Sensors, 762-765, 2005.
  3. M. Graf, D. Barrettino, S. Taschini, C. Hagleitner, A. Hierlemann and H. Baltes, "Metal oxide-based monolithic complementary metal oxide semiconductor gas sensor microsystem", Anal. Chem., 76:4437-4445, 2004.


Contact

Lihong Feng

Tamara Bechtold